New Entegris EUV 1010 Reticle Pod demonstrates low defectivity, enabling
the high-volume manufacturing of advanced technology nodes using EUV
lithography
BILLERICA, Mass.--(BUSINESS WIRE)--Aug. 2, 2018--
Entegris,
Inc. (NASDAQ: ENTG), a leader in specialty chemicals and advanced
materials solutions for the microelectronics industry, today released
the next generation EUV 1010 Reticle Pod for high-volume IC
manufacturing using extreme ultraviolet (EUV) lithography. Developed in
close collaboration with ASML, one of the world’s largest manufacturers
of chip-making equipment, Entegris’s EUV 1010 is the first to be
qualified by ASML for use in the NXE:3400B and beyond.
As the semiconductor industry begins ramping EUV lithography for the
high-volume manufacturing (HVM) of advanced technology nodes, keeping
EUV reticles defect-free is more demanding than ever. Entegris’s EUV
1010 Reticle Pod is now fully qualified by ASML for their latest
generation scanner having demonstrated outstanding protection of the EUV
reticles, including against the most critical particle challenges. As a
result, Entegris’s EUV 1010 enables customers to safely transition to
smaller and smaller line widths, as needed for the most advanced
lithography processes.
To achieve these levels of performance within the NXE:3400B scanner,
Entegris developed new technologies for contacting the reticles and
controlling the environment. “The Entegris EUV 1010 represents a
significant breakthrough in improving defectivity so customers
implementing HVM for advance technology nodes can focus on increasing
efficiency and throughput,” said Paul Magoon, vice president of wafer
and reticle handing for Entegris. “Development and testing with ASML
ensures that EUV 1010 has been qualified for the most advanced EUV
scanner available.”
ABOUT ENTEGRIS
Entegris is a leader in specialty chemicals
and advanced materials solutions for the microelectronics industry and
other high-tech industries. Entegris is ISO 9001 certified and has
manufacturing, customer service and/or research facilities in the United
States, China, France, Germany, Israel, Japan, Malaysia, Singapore,
South Korea and Taiwan. Additional information can be found at www.entegris.com.
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Source: Entegris, Inc.
Media Contact:
Entegris, Inc.
Alexa Manocchio, +1
978-436-5659
Public Relations manager
alexa.manocchio@entegris.com