Ultra-Clean purification technology removes metals from solvents used in advanced semiconductor photolithography processes
Using uniquely tailored membrane technology, the new versatile purifier can efficiently remove both dissolved and colloidal metal contaminants from a wide variety of ultra-pure, polar and non-polar solvents.
"As sensitivities to metal contaminants rise, photochemical manufacturers are looking for new technology solutions to address the wide variety of defect-causing contaminants that are harder and more costly to control," said
Compatible with most solvents, including difficult-to-remove ketones like cyclohexanone, Purasol purifiers deliver superior cleanliness with exceptional critical metals-removal capabilities with single- or subparts-per-trillion contaminant levels removal performance. Two product options are available to target different solvent polarities (polar and nonpolar) in the removal of metals known to cause defects in photolithography applications.
For more information on Purasol purifiers, please visit the
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