Entegris Expands Sub-65nm Liquid Contamination Control Solutions

CHASKA, Minn., Jun 28, 2007 (BUSINESS WIRE) -- With the launch of its newest QuickChange ATE wet etch and clean (WEC) filter rated to 30nm retention, Entegris added the next generation to its reliable line of industry-standard non-dewetting Teflon liquid filters. Built on a track record of proven capability, the new QuickChange filters combine ease-of-use, rapid change-out and true 30nm particle retention to introduce a new level of flow performance to WEC processes.

"The proven reliability of the QuickChange family of WEC technologies provides peace-of-mind and performance in sub-65nm roadmap applications. The 30nm retention rating and exceptional flow performance allows our customers to achieve their roadmap objectives in critical front-end cleans as well as a variety of wet etch and stripping applications," said Chad Ruwe, Entegris vice-president, Liquid Microcontamination Control.

Entegris will debut the QuickChange ATE 30nm WEC filters at SEMICON West (Booth # 1020) in San Francisco, CA, USA July 17-19, 2007. Attendees will have the opportunity to meet with Entegris experts and discuss the QuickChange family of liquid filtration technologies.

ABOUT ENTEGRIS

Entegris is the global leader in materials integrity management - delivering a wide range of products for purifying, protecting and transporting critical materials used in processing and manufacturing in semiconductor and other high tech industries. Entegris is ISO 9001 certified and has manufacturing, customer service or research facilities in the United States, China, France, Germany, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.

QuickChange 30nm Retention Rating Non-Dewetting Teflon Filteris a trademark of Entegris Inc.

Entegris is a registered trademark of Entegris Inc.

SOURCE: Entegris

Entegris
Patty Hoffman, 612-455-1781
phoffman@psbpr.com
or
Steve Cantor, 978-436-6500
irelations@entegris.com