CHASKA, Minn.--(BUSINESS WIRE)--Dec. 6, 2006--Entegris, Inc. (NASDAQ:ENTG) announced the introduction of several new products for advanced 193nm (ArF) photolithography applications at Semicon Japan 2006. These products, which include the Impact^® Duo, Impact^® Mini, IntelliGen^® Mini and Optimizer^® ST, provide integrated solutions for the filtration and dispense of photochemicals and other coatings on to the wafer.

"In certain ArF processes, defects such as micro-bridging are still common and can lead to reduced yields and increased cost. We believe that by using our new filter and dispense products in these photochemical solutions, customers can significantly reduce the defects found in their processes," said Yuichi Tamura, product and technology development director of liquid microcontamination for Nihon Entegris in Japan.

The new products include:

• Impact Duo filter. Designed for advanced photochemical filtration, the Impact Duo combines advanced membrane technologies to provide the highest level of retention. These membrane technologies - sieving and non-sieving - utilize a dual-capture filtration mechanism to ensure defect-causing impurities are removed from photochemical solutions before reaching the wafer surface.
• IntelliGen Mini photochemical dispense system. The IntelliGen Mini dispense system utilizes proprietary two-stage technology and closed-loop pressure control to eliminate particulates and bubbles while providing accurate and repeatable dispense. By detecting variations during photoresist dispense that may be caused by bubbles or clogged nozzles, the IntelliGen Mini dispense system can prevent wafer scrap due to coating problems. Introduced in July 2006, the IntelliGen Mini photochemical dispense system has been specified by major OEMs for new track shipments, as well as by leading semiconductor device makers in Japan, Asia, Europe and North America to retrofit existing track dispense systems.
• Impact Mini. The Impact Mini filter is designed to work seamlessly with the IntelliGen Mini dispense system. The Impact Mini filter features an optimized filtration area and hold-up volume intended to minimize chemical waste, shorten filter change-out time and reduce defect levels during semiconductor fabrication. The filter design also utilizes a greater than 60 percent reduction in surface area, thus reducing overall photochemical usage costs associated with the unusable portion of photoresist solution in the fabrication process.
• Optimizer ST 30nm developer and DI water filter. The Optimizer ST filter provides improved particle retention and cleanliness for point-of-use developer and DI water filtration in ArF processes. Optimizer ST filters are designed to integrate with Entegris' Optimizer ST2 manifolds, taking advantage of our patented Connectology^® technology for a safer, more effective and faster filter change-out.

Chad Ruwe, vice president and general manager of liquid microcontamination for Entegris, said: "Entegris continues to lead the photochemical filtration and delivery markets by continuing to introduce application focused solutions to ensure our customers meet their technology roadmaps in a cost effective and timely manner. We are the only company in the semiconductor industry to offer a fully integrated solution for photoresist dispense and filtration."

For more information, please visit Entegris at exhibit # 2B-501 at Semicon Japan, December 6-8.

ABOUT ENTEGRIS

Entegris is the global leader in materials integrity management - delivering a wide range of products for purifying, protecting and transporting critical materials used in processing and manufacturing in semiconductor and other high tech industries. Entegris is ISO 9001 certified and has manufacturing, customer service or research facilities in the United States, China, France, Germany, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.

Impact, IntelliGen, Optimizer, Connectology and Entegris are registered trademarks of Entegris Inc.

CONTACT: Entegris, Inc.
Patty Hoffman, 612-455-1781


phoffman@psbpr.com
or
Steve Cantor, VP of Corporate Relations, 978-436-6500
irelations@entegris.com

SOURCE: Entegris, Inc.