News Release Details
Entegris Licenses RSP and Extreme Ultraviolet (EUV) Technology to Gudeng Precision Ltd.
The license agreements resolve disputes related to reticle pod technology
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Entegris provides advanced materials and process solutions to the semiconductor and other high-technology industries. (Credit: Zf L/ Moment Collection via Getty Images)
“We are pleased with the conclusion of these intellectual property cases,” said Entegris’ chief executive officer,
As semiconductor devices are increasingly engineered at atomic scale dimensions to enable new device architectures and new patterning schemes, Extreme Ultraviolet (EUV) lithography has been developed to successfully scale down complex patterns for the most advanced devices. EUV lithography patterns are stored on reflective glass reticles, which are both extremely valuable and highly vulnerable to contamination and breakage from mishandling. Entegris’ EUV pods protect reticles during their full life cycle from damaging particles, moisture and breakage.
Entegris is a world-class supplier of advanced materials and process solutions for the semiconductor and other high-technology industries. Entegris has approximately 5,300 employees throughout its global operations and is ISO 9001 certified. It has manufacturing, customer service, and/or research facilities in
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